Startup Substrate is building next-generation semiconductor fabs using advanced X-ray lithography. This goes beyond extreme ...

Intel has announced a new deal with ASML, the semiconductor manufacturing equipment firm, aimed at boosting research into cutting-edge construction techniques. Share on Facebook (opens in a new window ...

Imec has achieved the first successful wafer-scale fabrication of solid-state nanopores using EUV lithography on 300mm wafers. This innovation transforms nanopore technology from a lab-scale concept ...

ASML Holding ASML, a leading manufacturer of semiconductor lithography tools, is at the center of a major shift in advanced ...

New Ultra Track Leverages ACM’s Extensive Coater and Developer Expertise; ArF Model Expected to Ship in the Fourth Quarter of 2022 FREMONT, Calif., Nov. 17, 2022 (GLOBE NEWSWIRE) -- ACM Research, Inc.

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

Imagine a machine so advanced it operates with light invisible to the human eye, etching circuits onto silicon wafers at scales smaller than a virus. This is the world of EUV lithography, a ...

Canon has developed a new approach to lithography that reduces costs and energy consumption compared to ASML's EUV systems. Canon's new nanoimprint lithography machine imprints circuit patterns "like ...

Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...

“Full-chip curvilinear inverse lithography technology (ILT) requires mask writers to write full reticle curvilinear mask patterns in a reasonable write time. We jointly study and present the benefits ...