Aselta Nanographics of Grenoble, France, which produces software for wafer and mask patterning based on e-beam technology for IC manufacturing, along with advanced metrology solutions for scanning ...

One of the main challenges in developing semiconductor chip technology is making electronic components smaller and more effective. This difficulty is most noticeable in lithography, which is the ...

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

In April, 2023, I had the privilege of participating in Photomask Japan 2023 (PMJ2023), a web conference that brought together experts and enthusiasts in the field. The conference commenced with an ...

Photolithography involves the selective exposure of a photosensitive material to light, using a UV light source and a collimating optical system to create an image of a patterned mask onto a substrate ...