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The file Etch.MTW contains data on a dry etch process which etches silicon dioxide off silicon wafers during a batch microelectronic fabrication process (Lynch and Markle, 1997, pp. 81-83). The data are (C)Society for Industrial and Applied Mathematics and (C) American Statistical Association and are reproduced by permission of both organizations. During each batch run 18 wafers were processed and etch rate (angstroms per minute) was measured at nine positions on each wafer in a selection of six
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